FemtorFiber ultra 780

Key words:

产品描述

  • Powering the fastest two-photon lithography on the market
  • Super-compact cold laser head
  • Fully software controllable system
  • Optional internal AOM

In nanolithography applications and semiconductor microanalysis, resolution and stability are key to generate exceptional results.
TOPTICA's industrial-grade, compact, turn-key, and robust fiber-laser technology provides highest intrinsic stability and allows for deep integration of the light source into your equipment. The excellent spatial beam profile guarantees unmatched focusability and resolution, enabling you to unlock the true potential of your application. Sufficient power, short pulses, and an extremely clean temporal pulse shape combined with options for dispersion compensation and power control make the FemtoFiber ultra 780 the ideal choice for next generation two-photon polymerization and semiconductor analysis.

 

Laser Specifications* ultra 780
Short-pulse version
ultra 780
Standard version
ultra 780
High-power version
Center wavelength 780 nm
Pulse duration < 100 fs < 150 fs < 170 fs
Average output power [w. AOM, optional] > 1000 [>800] mW > 1000 [>1000] mW > 1500 [>1200] mW
Repetition rate 80 MHz
Motorized dispersion precompensation (GDD) -30,000 .. 0 fs²
Beam shape TEM00, M² < 1.3 TEM00, M² < 1.2
Linear polarization > 100:1, vertical
Output coupling Free space
Astigmatism < 25% < 20%
Beam asymmetry 0.8 to 1.2
Dimensions laser head 77 x 165 x 300 mm³ (H x W x D)
Weight laser head < 5 kg
Dimensions supply unit 131 x 484 x 600 mm³
Weight supply unit < 20 kg
Power supply 24V DC (AC power supply included)
Power consumption < 150 W
PC Interface Ethernet, USB
Environment temperature 19 - 25 °C (operating), 0 - 40 °C (storage and transport)
Environment humidity Non-condensing

 

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